High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx
![PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation](https://i1.rgstatic.net/publication/343048911_High_speed_and_ultra-low_dark_current_Ge_vertical_p-i-n_photodetectors_on_an_oxygen-annealed_Ge-on-insulator_platform_with_GeOx_surface_passivation/links/5f2213d992851cd302c87b15/largepreview.png)
PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation
High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation
High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx
![PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation](https://www.researchgate.net/profile/Yiding-Lin/publication/343048911/figure/fig5/AS:918793463271426@1596068840802/a-The-elevating-current-characteristics-of-p-i-n-vertical-photodetectors-on-annealed_Q320.jpg)
PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation
![Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1557%2Fs43580-021-00188-w/MediaObjects/43580_2021_188_Fig2_HTML.png)
Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink
![Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1557%2Fs43580-021-00188-w/MediaObjects/43580_2021_188_Fig1_HTML.png)
Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink
High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx
High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation
![PDF) Anomalous temperature dependence of photoluminescence in GeO x films and GeO x /SiO2 nano-heterostructures PDF) Anomalous temperature dependence of photoluminescence in GeO x films and GeO x /SiO2 nano-heterostructures](https://www.researchgate.net/profile/Vladimir-Volodin/publication/257841148/figure/fig3/AS:670705523900424@1536920066492/Temperature-dependence-of-PL-intensities-gures-are-experimental-data-lines-are_Q320.jpg)
PDF) Anomalous temperature dependence of photoluminescence in GeO x films and GeO x /SiO2 nano-heterostructures
![Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1557%2Fs43580-021-00188-w/MediaObjects/43580_2021_188_Fig3_HTML.png)
Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink
![PDF) Anomalous temperature dependence of photoluminescence in GeO x films and GeO x /SiO2 nano-heterostructures PDF) Anomalous temperature dependence of photoluminescence in GeO x films and GeO x /SiO2 nano-heterostructures](https://i1.rgstatic.net/publication/257841148_Anomalous_temperature_dependence_of_photoluminescence_in_GeO_x_films_and_GeO_x_SiO2_nano-heterostructures/links/552503ac0cf22e181e73bd2a/largepreview.png)
PDF) Anomalous temperature dependence of photoluminescence in GeO x films and GeO x /SiO2 nano-heterostructures
High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx
![Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink](https://media.springernature.com/w136h75/springer-static/image/art%3A10.1007%2Fs11082-018-1717-4/MediaObjects/11082_2018_1717_Fig1_HTML.png)
Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink
![PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation](https://www.researchgate.net/profile/Yiding-Lin/publication/343048911/figure/fig1/AS:918793463287809@1596068840592/a-Cross-sectional-transmission-electron-microscope-TEM-image-of-the-annealed_Q320.jpg)
PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation
![PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation](https://www.researchgate.net/profile/Yiding-Lin/publication/343048911/figure/fig2/AS:918793463271424@1596068840674/a-Top-view-SEM-image-of-the-Ge-vertical-p-i-n-photodetector-with-an-80-m-diameter-b_Q320.jpg)
PDF) High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx surface passivation
![Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink](https://media.springernature.com/w136h75/springer-static/image/art%3A10.1134%2FS1063782619120030/MediaObjects/11453_2020_2575_Fig1_HTML.gif)
Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink
METAL-TEMPLATED CRYSTALLIZATION OF GERMANIUM FOR OPTOELECTRONIC APPLICATIONS A DISSERTATION SUBMITTED TO THE DEPARTMENT OF APPL
High speed and ultra-low dark current Ge vertical p-i-n photodetectors on an oxygen-annealed Ge-on-insulator platform with GeOx
![Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink Growth and characterization of Ge QDs embedded in an α-GeOx (x < 0.1) matrix produced by magnetron sputtering and a post-grown annealing stage at low temperatures | SpringerLink](https://media.springernature.com/lw685/springer-static/image/art%3A10.1557%2Fs43580-021-00188-w/MediaObjects/43580_2021_188_Figa_HTML.png)